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This seems to be a pretty popular FIB. Based on the XL30?


Videos for GIS refill: https://www.youtube.com/channel/UCebcTTg_Al48R9Uxdy8sS9Q

Chemicals Markus is using to refill (TODO: get image of Ga bottle, process):

Markus fei fib200 chem merk hexacarbonyl-w.jpg Markus fei fib200 chem sa tetraethyl orthosilicate.jpg


General procedure is to wobble the focus and minimize how much drift occurs when sweeping. Looks something like this: https://youtu.be/Ln2GDMw-Vf8


  • Turn on roughing vacuum pump (sometimes the automated switching has failed, if not the computer does this for you)
  • In the FEI control software, click Pump
    • This will startup the TMP (Turbo Molecular Pump)
  • After chamber vacuum is around 10^-6, the status should say Vac OK
  • Press the HT (High Tension) physical switch on the desk
  • Click the HV icon in the software (it will show an error if you haven't pressed the physical switch first)
  • Wait for the voltage to ramp up to 30kV (unless in the beam current drop-down menu, you've selected low-magnification 10kV)
  • You might hope the computer auto-emission current algorithm works, if not...
    • Click apply near the emission current set-point textbox which shows 2.2
      • This should disable the feature, changing the icon from yellow to grey
    • Slowly (there is lag between clicking and seeing anything change) increase the extractor voltage from it's default of 12.00kV
      • Clicking in the whitespace will increase by 10X MORE than clicking the arrow buttons
    • Click apply above the extractor setting, to set/apply the default of 12.00kV
      • If this is causing the emission current to crash back to 0pA, then you can slowly click back down until the emission is around 2.2 pA
    • if you max out the extractor, and still see no emission current, then start increasing the suppressor voltage
      • if you see the emission current jump to it's max of 13pA, quickly click "apply" on the extractor to reset it to 12.00kV
  • once the emission current is stable around 2pA or so, and the extractor is set to 12.00kV, you're good to move on and attempt imaging


On photoresist which is totally planar

Since a sample (wafer, etc) that's been evenly spincoated with photoresist will not have any distinct features to focus on, one way to get started is as follows:

  • draw a hollow box pattern
  • mill the pattern for 5 to 10 seconds
  • erase the pattern (click the eraser several times, as sometimes patterns get stuck in memory)
  • set live imaging mode to low or medium res
  • get your hands ready to act quick on the coarse focus and astigmatism knobs!
  • start live imaging!
  • quickly adjust the focus in attempt to visualize and sharpen the box you just milled
  • if you ablate away the box before focusing well, mill another box, erase the pattern, and perform focusing again
  • zoom in 2 to 5 times past the working magnification you desire
  • mill a box, erase the pattern, focus again
  • now you can zoom back out and get to lithography!

NOTE: you need to re-perform this anytime you adjust the AVA (Automatic Variable Aperture), aka change the beam current


mcmaster: took a bunch of notes, but they were lost. I still have the pictures though

Problems when acquired:

  • LMIS empty
    • Fabricated replacement using Ga from Sigma-Aldrich, tungsten wire, syringe, and DIY spot welder
  • Sources were refilled?
  • Detector tube bad (outgassed)
    • Replaced
  • XeF2 leak. Damaged stage gears
    • Removed XeF2 GIS and blanked off
    • Bought similar replacement gears, machined to fit
    • TOOD: install new seals. Requires special XeF2 rated version not in other GIS
  • Faulty power supply
    • Repaired module (replaced resistor?)
  • Bad seal on pneumatic stabilizer
    • Bought (silicone?) sheet to repair
  • Turbo pump sometimes noisy, but seems to still work

Special modification to keep under vacuum when not in use. Time delay relay to make pulling vacuum in chamber softer (keep air inlet open initially to create a weak vacuum, then close it to create a hard vacuum):

Markus fei fib200 column under relay.jpg


GIS cluster:

Markus fei fib200 gis cluster1.jpg Markus fei fib200 gis cluster2.jpg Markus fei fib200 gis cluster3.jpg

A new Pt injector tip:

Markus fei fib200 gis pt-new btm.jpg Markus fei fib200 gis pt-new side.jpg Markus fei fib200 gis pt-new side2.jpg Markus fei fib200 gis pt-new top.jpg

This XeF2 injector sat for a long time in storage. The XeF2 ate through the seals and caused considerable damage in the FIB

Markus fei fib200 gis xef2-bad 1.jpg Markus fei fib200 gis xef2-bad 2.jpg Markus fei fib200 gis xef2-bad 3.jpg


Markus fei fib200 computer console.jpg

Markus fei fib200 computer front1.jpg Markus fei fib200 computer front2.jpg Markus fei fib200 computer front3.jpg

Markus fei fib200 computer back.jpg


Aperture motor test: https://youtu.be/TIqlTjR2UH4

Test edit after calibration (cut trace):

Markus fei fib200 edit1.jpg Markus fei fib200 edit2.jpg

GIS controller (pneumatics + heater controllers)

Markus fei fib200 gis control.jpg

High voltage power supply

Markus fei fib200 hv misc1.jpg Markus fei fib200 hv misc2.jpg

  • This box contains deflection amp power supply, as well as the HV supply for lens 2 (which is not powered from 230VAC, rather from a lower-voltage DB-9 type connector attached to the back of the desk). Deflection amp is provided with an output of: (150VDC+ GND 150VDC- 150VDC+ GND 150VDC-) Lens2 HV output is (???)
  • There are (4) of these supplies inside the deflection amp power supply, providing each leg of the 150VDC +/- outputs

Main power distribution

Markus fei fib200 power dist1.jpg Markus fei fib200 power dist2.jpg Markus fei fib200 power dist3.jpg

Chamber camera on left screen

Markus fei fib200 computer camera.jpg

Doc describing the LMIS column

Markus fei fib200 lmis doc.jpg


Continuous Dynode Electron Multiplier (CDEM)

Markus fei fib200 column detector1.jpg Markus fei fib200 column detector2.jpg Markus fei fib200 column detector3.jpg


Markus fei fib200 column1.jpg Markus fei fib200 column2.jpg Markus fei fib200 column3.jpg

Markus fei fib200 column chamber.jpg

Markus fei fib200 column side.jpg

Markus fei fib200 column under2.jpg Markus fei fib200 column under3.jpg Markus fei fib200 column under4.jpg Markus fei fib200 column under5.jpg

Markus fei fib200 column under front.jpg Markus fei fib200 column under.jpg

Markus fei fib200 column unit overview.jpg Markus fei fib200 column valves.jpg Markus fei fib200 floor support.jpg Markus fei fib200 sw1.jpg